October 15-17, 2007
Icho-Kaikan, Osaka University, Suita, Osaka, Japan
Sponsored by
The 21st Century COE Program “Atomistic Fabrication Technology”, Osaka University
The Japan Society for Precision Engineering (JSPE)
in cooperation with
The Japan Society of Applied Physics (JSAP)
The Physical Society of Japan (JPS)
The Technical Committee on Ultra Precision Machining of JSPE
Scope: The COE international symposium, “Atomistic Fabrication Technology”, is organized by the 21st Century COE Program at Osaka University and the Japan Society of Precision Engineering. The aim of the COE project is to develop production technology of optical and electronic devices with atomic-level accuracy on the basis of a new physical principle and to carry out collaborative research in conjunction with laboratories from other fields of basic science and advanced industry. This symposium will provide an opportunity for scientists and engineers to exchange information and ideas at the forefront of research on atomistic fabrication technology.
Papers are solicited in, but not limited to, the following areas:

Electronic Materials and Thin Films
solar cells, thin film transistors, optical coatings, growth/deposition methods, physical and electrical properties, surface and defect characterization

・Advanced Machining Technology and Its Application
optical fabrication and testing, advanced finishing technologies, surface smoothing, X-ray and synchrotron optics, semiconductor substrates

・Advanced Evaluation System for Nanostructures and Soft Materials
nanomethodology, synchrotron-radiation-based techniques, nanophotonics, surface plasmon, optical near-field phenomena, charge transport properties
・Computational Materials Modeling and Methodological Advances
electronic structures, quantum transport, large-scale molecular-dynamics simulation, nanoscale devices
・Semiconductor Processing Science and Future Electronic Devices
imaging and functionalization of semiconductor surfaces, Si-based materials, gate stack technology, biochemical sensors, novel device physics
A list of invited speakers includes:
・Prof. J. Engemann (Univ. Wuppertal, Germany)
・Prof. R. E. Schropp (Utrecht Univ., Netherlands)
・Prof. T. Kamiya (Tokyo Tech., Japan)
・H. Nakayama (Osaka City Univ., Japan)
・Dr. A. Schindler (The Leibniz Inst. Surf. Modif., Germany)
・Dr. G. Brady (Univ. Rochester, USA)
・Prof. T. Kuriyagawa (Tohoku Univ., Japan)
・M. Hori (Nagoya Univ., Japan)
・Prof. T. W. Ebbesen (Univ. Louis Pasteur, France)
・Prof. J. Purans (Univ. de la Mediterranee, France)
・Prof. A. Momose (Univ. Tokyo, Japan)
・Dr. M. Aono (National Inst. Mater. Sci., Japan)
・Prof. T. Saiki (Keio Univ., Japan)
・Dr. D. Wortmann (Research Centre Juelich, Germany)
・Dr. C. Joachim (National Center Sci. Research, France)
・Dr. S. Tsukamoto (National Inst. Mater. Sci., Japan)
・Prof. N. Kobayashi (Univ. Tsukuba, Japan)
・Dr. E. Cartier (IBM T. J. Watson Research Center, USA)
・Dr. P. Allongue (CNRS, France)
・Prof. M. Miyao (Kyusyu Univ., Japan)
・Prof. M. Niwano (Tohoku Univ., Japan)
・Prof. J. Hanna (Tokyo Tech., Japan)
Symposium Language:
The official language of the symposium is English.
Symposium Program:
The symposium Program can be downloaded from here
Instruction for Speakers:
At oral session, a PC projector will be available. Speakers wishing to present their paper using the PC projector are required to carry their own computer. Poster session is scheduled for Monday, October 15, from 16:25 to 18:25. Usable space on each poster board will be approximately 100 cm(W) x 200 cm(H). Each presentation will be assigned a board labeled with the paper number in the final program.
Authors of papers accepted in this symposium are encouraged to submit the original and significant part of the papers to the Special Issue of the Surface and Interface Analysis (SIA) (http://www3.interscience.wiley.com/cgi-bin/jhome/2009), which will be published in May 2008. The standard length is 4 journal pages including figures and tables. Instructions to Authors can be found at SIA's website . The submission site will open at the beginning of October. Please read these specific instructions very carefully in order to submit your manuscript to this special issue .
The deadline for submission to the Special Issue is Wednesday, October 17, 2007

It is strongly recommended that authors from non-English speaking countries have their manuscript reviewed and corrected by English Language Services before submission. Below is a recommended English Editing service. Authors who want to have their paper checked and improved can contact the service before submission. Please note that this is an optional service, paid for by the author.
Yamada English Service (http://www.wiley.co.jp/editservlist.html#e)
Prospective authors and participants are invited to preregister for the symposium. The symposium is free of charge. Please send an e-mail with the title“Preregistration”to 21coe-symposium@upst.eng.osaka-u.ac.jp by October 9, 2007. The e-mail should include your name, title, affiliation, address, Zip code, e-mail, phone and fax numbers.
October 16, 2007
Organizing Committee:
Chairperson: Katsuyoshi Endo
Members: K. Hirose, T. Kataoka, Y. Kuwahara, M. Morita, K. Yamauchi, K. Yasutake, and H. Watanabe
Steering Committee:
Chairperson: Yuji Kuwahara
Members: M. Akai-Kasaya, K. Arima, T. Hosoi, H. Inoue, K. Inagaki, S. Matsuyama, H. Mimura, H. Ohmi, T. Ono, Y. Oshikane, A. Saito, J. Uchikoshi and N. Zettsu
Program Committee:
Chairperson: Heiji Watanabe
Members: H. Goto, H. Kakiuchi, M. Nakano, Y. Sano, R. Shimizu, T. Shimura, and K. Yamamura
Symposium Web Site: http://www.upst.eng.osaka-u.ac.jp/21coe/english/21coe-symposium2007/index.html
Important Dates:
    Abstract Deadline: July 20, 2007
    Notification of Acceptance: August 6, 2007
    Pre-Registration Deadline: September 15, 2007
    Symposium: October 15-17, 2007

    Access to Osaka University (Suita Campus)
    Access to Icho-Kaikan (No.57)
    Symposium secretariat
    Phone/Fax: +81-6-6879-7298