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Overview |
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| [Program Summary] |
| The aim of the present project is (1) to develop production technologies of optical or electronic devices for practical use based on the rich accomplishments of the former COE project (Creation of Perfect Surface) conducted by the Osaka University, Ultra Precision Machining Research Center, (2) to continuously develop new "atomistic fabrication technology" based on a new physical principle, and (3) to carry out collaborative research in conjunction with laboratories from other field of basic science and advanced industry for product realization. Furthermore, by letting graduate students participate in the forefront of research, we will educate research leaders for next generation production technology. |
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| [Needs and Objectives for the Program] |
| Frequently, the realization of the specific types of optical or electronic devices with atomic-level accuracy (one tenth of a nanometer) becomes a key factor for drastic advancement in the field of basic science and advanced industry of the 21st century. Some of the examples of such "key devices" are ultra-precision mirrors for a gravitational wave telescope, a hard X-ray microscope, soft X-ray lithography as well as next generation SOI (silicon on insulator) devices, and SiC or GaN devices. To produce these key devices, it is necessary to develop "atomistic fabrication technology", in which physical and chemical phenomena in the production processes are fully controlled at atomic and electronic levels. In the former COE project, we developed epoch-making ultra-precision machining technologies as well as the processing equipments, and succeeded in producing X-ray mirrors with the world’s top performance and SOI wafers with ultra-thin Si layers for next generation semiconductor substrates. In the 21st century COE program, we plan to produce practical "key devices" based on our technology achieved in the former COE project, and by creating new "atomistic fabrication technology" on the frontier of basic science and advanced technology. By collaborating with other laboratories in the field of basic science and advanced industry, we will produce the desired "key devices" and contribute to push on with the frontier research. By letting young researchers participate in such cutting-edge research programs, we will educate research leaders for the next generation production technology. The COE shall remain to be a world leader in the fields of development and scientific systematization of "atomistic fabrication technology". |
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| [Plan for Formation of Research Center] |
We will develop large-scale programming codes for first-principles molecular dynamics simulations that will enable the design of new machining or thin film fabrication processes. By proving the effectiveness of the designed process in experiments using the Ultra Clean Facility, we will continuously research and develop "atomistic fabrication technology". In order to pursue these objectives, we will conduct the following two kinds of research projects. (1) Technology Application Project based on the ultra precision machining processes already developed by the COE. i) Development of the highly accurate manufacturing process of optical devices for the synchrotron radiation. ii) Development of the next generation high performance semiconductor devices using ultra thin SOI wafers. iii) Development of the high-rate deposition process for functional thin films.
iv) Development of low-environmental load machining and cleaning technology for semiconductor device manufacturing processes using ultra pure water only. (2) Collaborative Research Project with the laboratories in the other fields. i) Development of the ultra-low-loss mirror for gravitational wave telescope. ii) Clarification of biofunctional mechanisms and pharmaceutical application of molecularly labeled substances using SR light microscope observation. iii) Development of optical devices for the next generation EUV lithography system. iv) Development of the high-rate deposition process for high quality single crystal SiC and GaN substrates. |
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| [Education Implementation Plan] |
| Our extensive support programs for students and young researchers are (1) Education Program for Product Realization Leaders. We will educate competent researchers who are capable of transferring the results of basic research into practical use and commercialize them through participation in the Technology Application Projects and collaboration with other companies. (2) Collaboration Program with Other Fields. We will educate competent researchers who have the ability to understand the academic and technological background of other fields, and develop production technologies of key devices for practical use through participation in the Collaborative Research Projects. (3) Education Program of Elite Researchers. Our university’s juniors of talent, who are qualified based on their academic achievements, will be recruited for research projects, and will receive training until they complete the doctorate course. |
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