Center for Atomistic Fabrication Technology The 21st Century COE Program
, Osaka University
Home Site Map Japanese
Message from the Program Leader
The 21st Century COE Program
Overview
Image
Research Promotion Personnel
Atomistic Fabrication Technology
What is Atomistic Fabrication Technology?
EEM
Plasma CVM
Atmospheric Pressure Plasma CVD
Electro-chemical processing using only ultrapure water
Ultra-precision Aspheric Surface Measurement
SREM/STM
Ultra-weak Light Scattering Surface Measurement
Ab initio (first principal) Molecular Dynamics Simulation
Research Presentation
Scientific Papers
International Conferences
Other
Information
Message from the Program Leader

The Research Center for Ultraprecision Science and Technology, the Department of Precision Science and Technology, and the Division of Applied Surface Science of the Department of Materials and Life Science, all of which belong to the Graduate School of Engineering, Osaka University, have been selected as one of the 21st Century Center of Excellence (COE) Program institutions supported by the Ministry of Education, Culture, Sports, Science and Technology. They formed the ``Center for Atomistic Fabrication Technology'' (the development of a nanometer-scale surface creation system) in the academic year of 2003.

The fabrication of optical and electronic devices with atomic-level accuracy, which cannot be carried out by conventional technology, is required both at the industrial frontiers, which propel Japanese industry in the 21st century, and in basic science, which reveals the principles of nature. For example, ultraprecision mirrors for gravity-wave telescopes, X-ray microscopes, and next-generation extreme ultraviolet (EUV) lithographs are desired as optical elements, and semiconductor devices such as those based on silicon-on-insulators (SOIs) and those composed of substrates of SiC or GaN are desired as electronic elements. It is impossible to find the means to fabricate these extremely precise ``products'' by extending conventional manufacturing technologies, even if such technologies were improved and made sophisticated on the basis of experience. To fabricate new devices required by pioneering fields, it is necessary to develop new-century manufacturing technologies, not on the basis of experience or obtained know-how but on the basis of science itself.

In this 21st century COE program, we are attempting an ``extreme production,'' which is required in frontier science and technology fields. To produce optical and electronic devices requiring atomic-level accuracy, it is our mission to continuously develop ingenious production engineering technologies, which we call ``atomistic fabrication technology.'' Using these techniques, physical and chemical phenomena that will be used for production processes are clarified from the atomistic and electronic viewpoints and are utilized to the utmost by precise control. The fostering of human resources that lead to the development of such technologies is also our mission.

First, it is necessary to understand the physical and chemical phenomena occurring on the surface of a product that are used for surface fabrication technologies on the basis of the behavior of atoms and electrons. To understand such phenomena, we must clarify the surface reaction process that is used for the ``production'' technology by computer simulation based on the first principles of quantum mechanics. It is also necessary to substantiate this surface reaction process by observing atomic structure and electronic state with methods used in surface science. The development of new ultraprecision machining technologies based on phenomena clarified at the atomic and electron levels, as well as the development of film deposition and micromachining technologies for depositing multilayer thin films or nanostructures on surfaces by ultraprecision machining, is required. It is essential to predict the performance of thin films and nanostructures on the basis of first-principles simulation and to develop the ultimate measurement technology for evaluating surfaces, thin films and nanostructures fabricated by these technologies. The final goals of this program are to combine the technologies developed, to fabricate devices for realizing the desired purpose, and to evaluate the performance of these devices. Thus, we start with studies to clarify natural phenomena applicable to new technologies, then develop ingenious machining equipment with which such phenomena may be precisely controlled, actually produce optical and electronic devices, and finally measure and evaluate the performance of such devices.

Generally, ``production'' technology plays the role of a silent force behind the scenes. The development of a new technology alone does not necessarily lead to the widespread use of the technology. Research achievements can be shown to society only when a key device that has a decisive influence on the progress of a frontier scientific technology is fabricated. Therefore, we attempt to demonstrate global research achievements to society by actively promoting interacademic, government-academic and industry-academic partnerships and cooperation with research groups at other universities and research institutes involved in various frontier scientific fields such as space, biotechnology, medical care, electronic/information technology, and environment/energy.

Universities are the reservoir of many excellent research achievements that can be innovative technological seeds whose usefulness for society has not yet been realized because of the lack of ``production'' technology. ``Atomistic fabrication technology,'' the new concept described previously, is essential to transform frontier basic research achievements into ingenious products. If production technologies that nurture technological seeds in universities are developed, research achievements in universities can be returned to society. If the frontier technology seeds created in universities are commercialized by the development of original, advanced Japanese production technologies, high-value- added ``products'' will be created. Thus, we can contribute to the revival of manufacturing that is the lifeblood of Japanese industry.

Furthermore, we are aiming at fostering human resources capable of realizing key devices required in various basic science fields and advanced industries by research and development in ``atomistic fabrication technology.'' Students and young researchers are invited to carry out frontier research through which they may be educated to become research pioneers who can lead the next-generation ``production'' through practical education programs based on research. For this, we are planning three education programs: (1) a training program for leaders in research for commercialization; (2) a training program for personnel for promoting cross-sectoral cooperation in research; and (3) a program for identifying and training elite researchers.

An ultraclean room has been in operation as a research site. A new ultraclean facility approximately 500 m2 that can supply ultrapure water and ultrapure gas of the world’s highest quality was completed in March 2004. The best research environment has been created; therefore, we can pursue full-fledged research projects of the 21st century COE program for realizing ``atomistic fabrication technology.'' However, it is important to remember that the success of research and development depends on the sense of purposefulness and the ability of individual researchers, and that the driving force for the progress of research is their creativity. Highly motivated students and young researchers are expected to pursue research and development in pioneering fields with courage.

We are striving toward the development of the ``Center for Atomistic Fabrication Technology.'' Your continued support and cooperation will be greatly appreciated.

 
 
 
 
 
 
 
All Rights Reserved. Copyright (c) 2003 Osaka University.